TH CR. TMR TMCR DGC DGFA or A D smd. ANZ x 2. TAL x 2. D A TA x 2. D D70FY E 4CD. TF TAAH x 2. TDA x 2. P KEX-Hzt. Clock Radio Manuals. Clothes Dryer Manuals. Computer Monitor Manuals. Conference Phone Manuals. Convection Oven Manuals. Cooktop Manuals. Corded Headset Manuals. Cordless Telephone Manuals. CRT Television Manuals.
Digital Camera Manuals. Dishwasher Manuals. Door Manuals. DVD Player Manuals. DVD Recorder Manuals. DVR Manuals. Electric Grill Manuals. Electric Toothbrush Manuals. Chamber B is configured for silicon dioxide SiO 2 and amorphous silicon a-Si film deposition with boron and phosphorous doping options.
Wafers are transferred to the process chambers and are processed one at a time with deposition on only the top side of the substrate. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info lnf. There are several processes for this tool supported by the LNF.
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